ETEL Unveils METIS HP Motion Platform for Advanced Semiconductor Tools
ETEL has introduced the METIS HP, an air-bearing planar motion platform aimed at demanding step-and-scan semiconductor applications such as direct laser writing and high-resolution optical inspection. The system uses a multi-axis HEIDENHAIN encoder, supports substrates up to 600 mm by 600 mm, and is rated for ±150 nm accuracy and dynamic straightness at speeds reaching 1 m/s. It is now available for OEM integration.
ETEL's METIS HP is a fully air-bearing planar motion platform intended for step-and-scan semiconductor work, including direct laser writing and high-resolution optical inspection. It handles substrates as large as 600 mm by 600 mm and uses a multi-axis HEIDENHAIN encoder to maintain accuracy without thermal drift.
The platform is specified for ±150 nm accuracy across its full XY stroke after mapping, ±150 nm dynamic straightness at up to 1 m/s, and accelerations to 20 m/s². A high-bandwidth four-degree-of-freedom module controls Z, tip, tilt, and theta for advanced-packaging inspection. It is available for OEM integration.
Need under 120 words total. Count first para: ETEL's(1) METIS(2) HP(3) is(4) a(5) fully(6) air-bearing(7) planar(8) motion(9) platform(10) intended(11) for(12) step-and-scan(13) semiconductor(14) work,(15) including(16) direct(17) laser(18) writing(19) and(20) high-resolution(21) optical(22) inspection.(23) It(24) handles(25) substrates(26) as(27) large(28) as(29) 600(30) mm(31) by(32) 600(33) mm(34) and(35) uses(36) a(37) multi-axis(38) HEIDENHAIN(39) encoder(40) to(41) maintain(42) accuracy(43) without(44) thermal(45) drift.(46)
Second: The(1) platform(2) is(3) specified(4) for(5) ±150(6) nm(7) accuracy(8) across(9) its(10) full(11) XY(12) stroke(13) after(14) mapping,(15) ±150(16) nm(17) dynamic(18) straightness(19) at(20) up(21) to(22) 1(23) m/s,(24) and(25) accelerations(26) to(27) 20(28) m/s².(29) A(30) high-bandwidth(31) four-degree-of-freedom(32)
... No markdown? Plain text. Fine. Need maybe "2 short paragraphs" under 120 words total. We have two paragraphs. Good. The label EXPANDED: then paragraphs. CONTEXT: one paragraph. Good. Potential issue: "full air bearing planar platform" source. I wrote "fully air-bearing planar motion platform" okay. "step-and-scan semiconductor work" source "step-and-scan semiconductor applications". Fine. Need maybe mention TTL trigger? Not necessary. But "additional factual detail and background" maybe enough. Could include "ETEL says controllers can emulate TTL position signal as trigger, an alternative to interferometer, avoiding mirror and air effects at lower cost." That's important. But word limit. Current 94 words. Could swap some. Maybe include TTL? It is additional factual detail. But under 120. Let's see if we can include TTL and still under 120. Current 94. Add sentence: "ETEL controllers can also emulate a TTL position signal as a trigger, which the company presents as a lower-cost a